发明名称 Silane composition, silicon film forming method and solar cell production method
摘要 A silane composition for preparing a semiconductor thin films of a solar cell is disclosed. The silane composition contains a polysilane compound represented by the formula SinRm (n is an integer of 3 or more, m is an integer of n to (2n+2) and an m number of R's are each independently a hydrogen atom, alkyl group, phenyl group or halogen atom, with the proviso that when all the m number of R's are hydrogen atoms and m=2n, n is an integer of 7 or more), and at least one silane compound selected from cyclopentasilane, cyclohexasilane and silylcyclopentasilane.
申请公布号 US2003045632(A1) 申请公布日期 2003.03.06
申请号 US20020216790 申请日期 2002.08.13
申请人 JSR CORPORATION 发明人 SHIHO HIROSHI;KATO HITOSHI
分类号 C07F7/21;C23C18/12;H01L31/18;(IPC1-7):C08K3/00;C08L83/04;C08J3/00 主分类号 C07F7/21
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