发明名称 FIELD EFFECT TRANSISTOR FORMED ON INSULATING SUBSTRATE AND INTEGRATED CIRCUIT THEREOF
摘要 PURPOSE: A field effect transistor formed on an insulating substrate and its integrated circuit are provided to operate at both of positive and negative potentials with respect to a conventional body potential. CONSTITUTION: A field effect transistor employs a structure in which a body contact region(131) is interposed between source regions(121) in order to realize a higher maximum allowable voltage with a smaller area. In order to realize the bipolar transistor with an increased channel width without external wirings for fixing a body potential, a structure of a transistor is also formed in which a drain/source region(111,121), a first gate electrode, a portion where a body contact region is arranged with a second region having a first conductivity type, a second gate electrode, and a source/drain region are arranged.
申请公布号 KR20030019179(A) 申请公布日期 2003.03.06
申请号 KR20020051214 申请日期 2002.08.28
申请人 HAYASHI YUTAKA;SEIKO INSTRUMENTS INC. 发明人 HASEGAWA HISASHI;HAYASHI YUTAKA;OSANAI JUN;TAKASU HIROAKI
分类号 H01L29/78;H01L21/336;H01L29/423;H01L29/786;(IPC1-7):H01L29/78 主分类号 H01L29/78
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