发明名称 METHOD FOR TREATING NON-GLITTER IN RING CRAFTING
摘要 PURPOSE: Regular non-glitter surface is obtained with an initial mark easily, and mass production is available. CONSTITUTION: A mold is composed of a ring mold(10) and a pressing plate(20). A mark of non-glitter is designed in the ring mold, and a glitter surface is wiped out to form a relief of non-glitter. A silicon plate of a thermal-forming silicon is used having thickness of 2-3 mm. The silicon plate is attached to the ring mold and pressed to form a silicon body. The silicon body is attached to a frame. Workpiece is inserted to the frame contacting the silicon body, and diamond particles are injected in a high pressure to obtain non-glitter surface.
申请公布号 KR20030019498(A) 申请公布日期 2003.03.06
申请号 KR20030005038 申请日期 2003.01.25
申请人 SO, BYUNG DON 发明人 SO, BYUNG DON
分类号 B24C1/06;(IPC1-7):B24C1/06 主分类号 B24C1/06
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