| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent a wafer, which is transferred through semiconductor manufacturing processes, from being detected falsely. SOLUTION: The detecting device, which detects the wafer W being transferred through vacuum atmosphere in the semiconductor manufacturing process, is composed of a light emitting section 81a which emits measuring light in a direction crossing the transferring course of the wafer W, a reflective plate 82 which changes the wave characteristic of the measuring light emitted by the light emitting section 81a and reflects it, and a photo detecting section 81b which receives only the reflecting light reflected by the reflective plate 82. Therefore, the false detection can be prevented even in the case the wafer W having such a surface characteristic that irregular reflection occurs thereon, and the detection can be accurately carried out.</p> |
