发明名称 FILM THICKNESS MONITOR AND METHOD FOR MEASURING THICKNESS OF FILM
摘要 PROBLEM TO BE SOLVED: To provide a film thickness monitor and a method for measuring thickness of film which can accurately measure the thickness of thin film sample. SOLUTION: The monitor is set so that sampling light emitted from a light source 1 enters a sample to be measured, and reflecting light from the sample to be measured is collected. The collected reflecting light interferes with reflecting light from a reflective mirror 15b at a beam splitter 12b and is guided to a photoreceptor 16. A drive stage 14 driving in a prescribed direction 17 and reflective mirrors 15a, 15b on the drive stage 14 vary the length of optical path of reference light, and thereby vary the difference of phase between the reflecting light and the reference light.
申请公布号 JP2003065722(A) 申请公布日期 2003.03.05
申请号 JP20010259762 申请日期 2001.08.29
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 CHOKAI MINORU
分类号 G01B11/04;(IPC1-7):G01B11/04 主分类号 G01B11/04
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