发明名称 BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING BLACK MATRIX
摘要 PROBLEM TO BE SOLVED: To provide a black photosensitive resin composition containing a resin coated carbon black and having satisfactory resolution and sensitivity. SOLUTION: The black photosensitive resin composition, contains (A) resin coated carbon black, (B) a binder resin, (C) an addition polymerizable compound having an ethylenically unsaturated bond and (D) a photopolymerization initiator and this photopolymerization initiator is a compound having a trihalomethyl group. When a layer (3) comprising the black photosensitive resin composition is formed on a substrate (4), exposed and developed, a black matrix (2BM) is formed and a color filter can be produced.
申请公布号 JP2003066598(A) 申请公布日期 2003.03.05
申请号 JP20010259241 申请日期 2001.08.29
申请人 SUMITOMO CHEM CO LTD 发明人 NAKAI HIDEYUKI;MURO SEIJI
分类号 G03F7/004;C08F2/44;C08F265/06;G02B5/00;G02B5/20;G03F7/027;G03F7/029;G03F7/033;G03F7/038 主分类号 G03F7/004
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