| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming ruggedness on a photosensitive insulating film having uniform reflectivity and a reflection electrode and a method of manufacturing a liquid crystal display having the rugged structure reflection electrode. SOLUTION: An interval d2 between light shielding patterns 614 in a 1st part corresponding to the upper side of metal patterns 450, 450b, 470, 475 in light shielding patterns 612, 614 of a 2nd mask 610 containing light projecting regions 605, 614 transmitting incident light and the light shielding pattern 612, 614 reflecting incident light is made narrower by a prescribed ratio than an interval d1 between the light shielding patterns 612 corresponding to the upper side of a 2nd part where the metal pattern is absent. The photosensitive insulating film is exposed and developed to form ruggedness on the surface of the photosensitive insulating film. Dents or grooves have the same depth through the photosensitive insulating film and the reflection electrode formed thereon and the uniformity of the reflection efficiency is improved through the whole display region. |
