SPUTTERING TARGET AND METHOD FOR PRODUCING PHASE SHIFTING MASK BLANK, AND PHASE SHIFTING MASK USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a phase shifting mask blank and a phase shifting mask having very excellent chemical resistance by using a material consisting essentially of a metal and a boron-doped silicon as a sputtering target when a phase shifting film is produced by sputtering. SOLUTION: The sputtering target used for forming the translucent regions of a phase shifting mask consists essentially of the metal and the boron-doped silicon.