METHOD AND APPARATUS FOR MEASURING THICKNESS OF VAPOR DEPOSITED FILM

摘要

PROBLEM TO BE SOLVED: To provide an on-line measuring method for the film thickness of a very thin vapor deposited film deposited on a high speed running film, by which a plurality of elements are measured simultaneously with high sensitivity and high precision continuously over a long period. SOLUTION: In the method for determining the film thickness by irradiating the surface of the vapor deposited film of a single film or a multiple layer film deposited on the film by a winding type film coating apparatus with primary X-ray in the apparatus after vapor deposition and measuring the intensity of secondary X-ray produced from the vapor deposited film, the system for detecting the secondary X-ray is an energy dispersive system constituted of a semiconductor detector, a multi channel analyzer and a counter circuit.