发明名称 SOLUTION ADJUSTING DEVICE OF DEVELOPING MACHINE FOR PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a processing agent take-out method by which a processing agent is easily taken out without soiling the hands when the processing agent is used, the amount of residual processing agent in a container is decreased and the fluctuation in performance of the processing agent is reduced, and to provide a processing agent container excellent in disposability. SOLUTION: This developing machine for photosensitive material having a washing device for washing the inside of the container filled with the processing agent for photosensitive material after or in the midst of taking out the processing agent from the container into a processing solution tank in the developing machine for photosensitive material, is characterized in that, after the aperture part of the container is arranged below, it is opened by a nozzle for supplying the washings of the washing device, and a notch larger than the diameter of the tip of the nozzle is formed at the aperture part.
申请公布号 JP2003066579(A) 申请公布日期 2003.03.05
申请号 JP20020199662 申请日期 2002.07.09
申请人 KONICA CORP 发明人 NOGAMI AKIRA;TSUKAMOTO YUKIO
分类号 G03D3/06;G03D13/04;(IPC1-7):G03D3/06 主分类号 G03D3/06
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