| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and an apparatus for inspecting laminated thin films whereby a film thickness and a density of an nm oxide film of a magnetic resistance type sensor or the like can be quickly measured and analyzed while hardly affected by a change of film thicknesses and densities of the other laminated thin films. SOLUTION: In the method for inspecting the laminated thin film by which a layer structure of the laminated thin film is inspected by sending X rays by a low angleθinto a laminated body having two or more thin films formed on a substrate, measuring an X-ray reflectivity from the laminated thin film and analyzing the reflectivity, when a refractive index of the thin film is made n=1-(λ/4π)<2> (ξ+iη) whereinλis an X-ray wavelength by a unit ofÅ, the X-ray wavelength whereby a square of a refractive index difference at an interface of the laminated film other than the test objectΔN<2> =Δξ<2> +Δη<2> becomes 1.5×10<-8> or smaller is used, and a criterion whereby a square sum of a residual between the reflectivity from a laminated thin film as a standard and the reflectivity from the laminated thin film as the test object becomes not larger than an allowable value calculated from the change of the density and the film thickness is set. The apparatus for inspecting the laminated thin film is provided with an analysis means based on the inspection method.</p> |
