| 摘要 |
PROBLEM TO BE SOLVED: To provide a photothermographic imaging material having high sensitivity, low fogging and excellent photographic performances, to provide a photothermographic imaging material also having improved light fogging resistance particularly after thermal development and to provide a photothermographic imaging material having a high film strength and less liable to scuffing. SOLUTION: The photothermographic imaging material having at least a photosensitive layer containing photosensitive silver halide grains, an organic silver salt, a reducer for the organic silver salt and a binder on a support, is characterized in that a polymer obtained by copolymerizing a monomer unit having an anti-light-fogging group represented by formula (1) and a vinyl monomer unit having no anti-light-fogging group is contained.
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