发明名称 METHOD FOR CLEANING TREATMENT FOR DEPOSITED FILM FORMING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for cleaning treatment for the inside of a deposited film forming equipment for producing an inexpensive electrophotographic photoreceptor of high quality. SOLUTION: A heating element in a vacuum system is set as a means for heating the inside of a reaction vessel before the start of DE (cleaning) treatment, and is heated at >=100 deg.C. After that, ClF3 whose concentration is controlled to 25 to 80% by the mixing of a dilution gas into a gaseous starting material for DE is introduced into the reaction vessel, and electric power is applied thereto from a high-frequency power source so as to be an excited state by plasma energy, and its reaction with a deposition film/or a by-product is caused. Thus, they are made into gas phase molecules, and are exhausted by an exhausting means to clean the deposited film forming equipment.
申请公布号 JP2003064476(A) 申请公布日期 2003.03.05
申请号 JP20010252976 申请日期 2001.08.23
申请人 CANON INC 发明人 MATSUOKA HIDEAKI;SEKI YOSHIO;TAKADA KAZUHIKO;KATAGIRI HIROYUKI
分类号 G03G5/08;C23C16/44;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C16/44;H01L21/306 主分类号 G03G5/08
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