| 摘要 |
PURPOSE: A method and an apparatus for dry surface cleaning are provided to remove contaminants by modifying a laser beam to a short wavelength laser beam and generating shock waves. CONSTITUTION: An organic contaminant removal portion modifies a long wavelength laser beam irradiated from a laser source to a short wavelength laser beam and irradiates the short wavelength laser beam to a surface of a target object(22). A dry particle removal portion collects idle laser beams and generates plasma shock waves(8). The organic contaminant removal portion includes one or more frequency harmonic generators(11,12) for modifying the long wavelength laser beam to the short wavelength laser beam and a plurality of mirrors for inducing the short wavelength laser beam to the surface of the target object(22). The dry particle removal portion includes a plurality of mirrors(14) for inducing the idle laser beams to the surface of the target object and a focus lens(15) for generating the shock waves(8).
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