发明名称 Semiconductor device and a method of manufacturing the same
摘要 In a high frequency amplifying MOSFET having a drain offset region, the size is reduced and the on-resistance is decreased by providing conductor plugs 13 (P1) for leading out electrodes on a source region 10, a drain region 9 and leach-through layers 3 (4), to which a first layer wirings 11a, 11d (M1) are connected and, further, backing second layer wirings 12a to 12d are connected on the conductor plugs 13 (P1) to the first layer wirings 11s, 11d (M1).
申请公布号 US6528848(B1) 申请公布日期 2003.03.04
申请号 US20000666772 申请日期 2000.09.20
申请人 HITACHI, LTD. 发明人 HOSHINO YUTAKA;IKEDA SHUJI;YOSHIDA ISAO;KAMOHARA SHIRO;KAWAKAMI MEGUMI;MIYAKE TOMOYUKI;MORIKAWA MASATOSHI
分类号 H01L29/78;H01L21/336;H01L21/8234;H01L23/482;H01L23/532;H01L27/04;H01L27/088;H01L29/417;(IPC1-7):H01L29/72 主分类号 H01L29/78
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