发明名称 Photomask ESD protection and an anti-ESD pod with such protection
摘要 An active anti-ESD pod for transporting photomask (reticle) comprises six body portions delimiting the container, an electrically conducting plate on the top portion, and an electrically conducting handle connected to the plate. An active charge sinker combined with a tag identifying the container or placed onto the photomask itself is provided to absorb the static electricity and to thus prevent charge accumulation that may otherwise cause ESD damage to the photomask.
申请公布号 US6528836(B2) 申请公布日期 2003.03.04
申请号 US20010904388 申请日期 2001.07.12
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD 发明人 LEE FU-SHENG
分类号 G03F1/14;G03F7/20;H01L21/673;(IPC1-7):H04L27/108 主分类号 G03F1/14
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