发明名称 |
Hydrogen annealing process and apparatus therefor |
摘要 |
An apparatus for selectively implementing a depressurized or an atmospheric hydrogen annealing process comprises a reaction chamber, a hydrogen gas introduction line for feeding hydrogen gas into the reaction chamber and an atmospheric exhaust line and a depressurized exhaust line, which are connected to the reaction chamber. By selectively switching the atmospheric exhaust line and the depressurized exhaust line, the depressurized hydrogen annealing process and the atmospheric annealing process are selectively implemented. A device for performing deoxidization process or a device for removing impurities may be further included.
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申请公布号 |
US6527884(B1) |
申请公布日期 |
2003.03.04 |
申请号 |
US20000708204 |
申请日期 |
2000.11.07 |
申请人 |
HITACHI KOKUSAI ELECTRIC, INC. |
发明人 |
TAKAKUWA YASUNORI;TOMETSUKA KOUJI |
分类号 |
H01L21/3205;C21D1/76;C21D1/773;H01L21/321;H01L21/324;H01L23/52;(IPC1-7):C21D1/26 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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