Method of fabricating an array substrate for an x-ray detector

摘要

An array substrate for use in an X-ray sensing device is fabricated using an etching stopper that enables good control of the etching process, and an electrode that prevents damage caused by static electricity generated during a dry-etching step. During fabrication, the array substrate includes a plurality of gate lines that are all electrically connected to an electrode pattern via gate line extensions and gate line contact holes. The electrode pattern causes the gate lines to have equipotentials, which reduces static electricity induced defects.