发明名称 PHOTOCATALYST-COATED PLATE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photocatalyst-coated plate which surely restrains rupture of a layer containing a photocatalytic semiconductor and delamination during bending process of a substrate while keeping a high photocatalytic activity, thereby improving industrial productivity, and a manufacturing method therefor. SOLUTION: A second layer consisting of a mixture 3 containing at least one photocatalytic semiconductor material selected from TiO2 , ZrO2 , ZnO, SnO2 , SrTiO3 , WO3 , Bi2 O3 , and Fe2 O3 is applied to the upper surface of a first layer consisting of a flexible primer 2 coated on at least one surface of a steel plate 1 so that the second layer has a coverage of 50-95%, and comprises three- dimensional dots each having a diameter of 100-1,000μm and a height of 0.3-30μm.
申请公布号 JP2003062471(A) 申请公布日期 2003.03.04
申请号 JP20010260436 申请日期 2001.08.29
申请人 KAWASAKI STEEL CORP;KAWASAKI STEEL METAL PRODUCTS & ENGINEERING INC;KAWATETSU GALVANIZING CO LTD 发明人 TOFUJI TAKESHI;TERADA TOSHIHIRO;NAKAJO HIROSHI;SADO HIDEAKI
分类号 B05D1/28;B01J35/02;B01J37/02;B05D5/00;B32B15/08;B32B27/18;(IPC1-7):B01J35/02 主分类号 B05D1/28
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