| 摘要 |
PURPOSE: A method for making mask or mask blank by using wasted mask is provided to reduce a loss due to the waste mask by regenerating the waste mask. CONSTITUTION: A regenerated original mask is collected(401). The presence of a pellicle portion is checked(403). The pellicle portion is removed if there is the pellicle portion(405). A cleaning process and dry process for an IPA solution are performed after the pellicle portion is removed(407). The presence of a functional membrane portion is checked(409). The functional membrane portion is removed by using an etching solution such as chrome etchant if there is the functional membrane portion(411). The etchant is cleaned by performing a rising process and a dry process after the functional membrane portion is removed(413). An additional can be performed if necessary(415). A substrate is extracted from the regenerated original mask and the cleaning process is performed(417).
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