发明名称 CHAMBER HAVING INNER WALL FORMED WITH DOUBLE LAYERS
摘要 PURPOSE: A chamber having an inner wall formed with double layers is provided to restrain the generation of particles by improving the quality of an inner wall of a dry etch chamber. CONSTITUTION: An inner wall(102) of a chamber is formed with an aluminum anodizing shield ring(102A) and a special plastic layer(102B). The aluminum anodizing shield ring(102A) is formed on the outside of the inner wall(102) of an etch chamber. The special plastic layer(102B) is inserted into the inside of the aluminum anodizing shield ring(102A). The special plastic layer(102B) is formed with a fluoric resin material such as polyimide. The etch chamber is formed with a dry etch chamber such as MERIE(Magnetically Reactive Ion Etching) chamber.
申请公布号 KR20030017753(A) 申请公布日期 2003.03.04
申请号 KR20010050752 申请日期 2001.08.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, BYEONG HYEON;KIM, SANG HO
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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