发明名称 |
CHAMBER HAVING INNER WALL FORMED WITH DOUBLE LAYERS |
摘要 |
PURPOSE: A chamber having an inner wall formed with double layers is provided to restrain the generation of particles by improving the quality of an inner wall of a dry etch chamber. CONSTITUTION: An inner wall(102) of a chamber is formed with an aluminum anodizing shield ring(102A) and a special plastic layer(102B). The aluminum anodizing shield ring(102A) is formed on the outside of the inner wall(102) of an etch chamber. The special plastic layer(102B) is inserted into the inside of the aluminum anodizing shield ring(102A). The special plastic layer(102B) is formed with a fluoric resin material such as polyimide. The etch chamber is formed with a dry etch chamber such as MERIE(Magnetically Reactive Ion Etching) chamber.
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申请公布号 |
KR20030017753(A) |
申请公布日期 |
2003.03.04 |
申请号 |
KR20010050752 |
申请日期 |
2001.08.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, BYEONG HYEON;KIM, SANG HO |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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