SEMICONDUCTOR FABRICATION APPARATUS INCLUDING HEATER HAVING THE SAME AS SHAPE OF WAFER

摘要

PURPOSE: A semiconductor fabrication apparatus including a heater having the same as a shape of a wafer is provided to prevent the abnormal formation of a layer on a flat part of a wafer by removing a part of a heater corresponding to the flat part of the wafer loaded on the heater. CONSTITUTION: A wafer as a processing target is loaded on a heater. A ceramic purge ring is used for supply uniformly a reaction gas to a lower face of the wafer loaded on the heater. The heater has the same as a shape of the wafer. The wafer has a flat part. A part of the heater corresponding to the flat part of the wafer is removed. Accordingly, the flow of the reaction gas and a non-reaction gas discharged from the heater is constantly maintained by removing the corresponding part of the heater corresponding to the flat part of the wafer loaded on the heater.