| 摘要 |
PURPOSE: An optical mask, a method for fabricating the same, and a method for sensing and mending a defect of the same are provided to increase contrast of the optical mask and improve an image characteristic of the optical mask by forming conductive lines connected with conductive patterns on a mask substrate of a transparent nonconductor. CONSTITUTION: A mask substrate(30) is formed with a transparent nonconductor. A plurality of conductive patterns(31,32,33a,33b,33c,33d,33e,37) are formed on an upper portion of the mask substrate(30). In addition, a plurality of conductive lines(35a,35b,35c,35d) are formed on the upper portion of the mask substrate(30). The mask substrate(30) is generally formed with quartz. The conductive patterns (31,32,33a,33b,33c,33d,33e,37) are formed with chrome when an optical mask is a chrome binary mask. A shift layer can be inserted between the conductive patterns (31,32,33a,33b,33c,33d,33e,37) and the mask substrate(30) when the optical mask is a phase shift mask. |
