IN-LINE SPUTTERING SYSTEM

摘要

PURPOSE: An in-line sputtering system is provided to improve productivity and quality of a thin film by obtaining a continuous and stabilized substrate flow. CONSTITUTION: An entry loadlock machine(100) has an entry loadlock chamber(102). A buffer heating machine(200) has a buffer heating chamber(202). An entry transfer machine has an entry transfer chamber(302). The first sputtering machine(400) has the first coating chamber(402). A heating machine(500) has a heating chamber(502). The second sputtering machine(600) has the second coating chamber(602). A firing machine(700) has a firing chamber(702). A discharge transfer machine(800) has a discharge transfer chamber(802). A buffer cooling machine(900) has a buffer cooling chamber(902). A discharge loadlock machine(1000) has a discharge loadlock chamber(1002). The machines(100-1000) and the chambers(102-1002) are connected to each other by an in-line method.