METHOD FOR FABRICATING (100) DIRECTIONAL GAAS BEAM WITH RECTANGULAR CROSS-SECTION

摘要

PURPOSE: A method for fabricating a (100) directional GaAs beam having a rectangular cross-section is provided to obtain a floated (100) directional GaAs beam by using a (001) GaAs substrate as a structural material. CONSTITUTION: An etch mask having a (100) directional boundary is patterned by using a (001) GaAs substrate. A stepped structure is formed perpendicularly to a wall face of a structure by wet etching or dry etching. The amount of undercut corresponds to the amount of etch to the direction of depth if the wet etching is done. A wall protection layer of the fabricated structure is formed. A (100) directional beam is floated by the wet etching of the structure having the wall protection layer.