| 摘要 |
<p>PROBLEM TO BE SOLVED: To properly support a substrate by using Bernoulli's effect by a support of a simple structure. SOLUTION: A shielding face 121a in which may very small spouting ports 121b used to spout a gas are formed, and a shielding part 12 which comprises a space 12a used to supply the gas to the shielding part 12 are formed in the substrate treatment apparatus 1. The spouting ports 121b are set at a diameter of 2 mm or less in a cross section perpendicular to the formation direction of a hole, and they are arranged annularly along the peripheral edge of the substrate 9. The substrate 9 is turned by a pin 112, and a treatment liquid is discharged to the rear surface of the substrate 9 by a supply pipe 311. Consequently, when the rear surface of the substrate 9 is treated, the shielding part 12 can be used as the support of the simple structure which properly supports the substrate 9 from the upper part by using Bernoulli's effect.</p> |
