| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a pattern by which a photosensitive paste in a region where the paste should be removed by developing can be surely removed to form a desired pattern when patterning is carried out by a photolithographic method and to provide a method for manufacturing a circuit board and a ceramic multilayered board by using the above method. SOLUTION: After a base layer 2 is formed by applying a composition A for the base layer which can be developed with a developer of a photosensitive paste layer 3 on a supporting body (alumina insulating substrate) 1, a photosensitive paste B containing inorganic powder and a photosensitive organic component is applied on the base layer 2 to form the photosensitive paste layer 3. After at least the photosensitive paste layer 3 is exposed, the photosensitive paste layer 3 and the base layer 2 are developed to form a pattern (unbaked pattern) 6. |
