CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a chemical amplification type positive resist composition suitable for lithography with an excimer laser such as ArF or KrF, having good various resist performances such as sensitivity and resolution and giving improved line edge roughness. SOLUTION: The chemical amplification type positive resist composition comprises a resin which is alkali-insoluble and is made alkali-soluble by the action of an acid, an acid generator and a biadamantane derivative such as a compound of formula (I) (where R1 and R2 are each H or an ester group).