PELLICLE FILM FOR LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To obtain a pellicle film for lithography which has excellent transmitting property for vacuum UV light, particularly F2 laser light (at 157 nm), which suppresses decrease in the transmittance or in the film thickness by photolysis and which can maintain excellent weather resistance and transmitting property for a long period of time. SOLUTION: The pellicle film consists of a solvent soluble fluorine-containing polymer (A). The fluorine-containing polymer (A) is amorphous of a chain structure having no cyclic structure in the main chain. The film has <=0.5μm<-1> absorbance at 157 nm.