| 摘要 |
<p>PROBLEM TO BE SOLVED: To give a reaction chamber comprising a wafer-support-pin operating mechanism by which a semiconductor wafer can be raised or lowered stably in such a way that a substrate support pin is not hooked or the like. SOLUTION: The reaction chamber used to treat the semiconductor wafer is composed of a susceptor which supports the semiconductor wafer inside the reaction chamber and which comprises a plurality of vertically formed through holes, a movement means which vertically moves the susceptor at least between a first position and a second position, a plurality of wafer lift pins on one side of which are fixed and supported by a lift member, which are extended to the vertical direction and which move the through holes to the vertical direction, and a lift member linked to a raising and lowering mechanism used to move the wafer lift pins to the vertical direction.</p> |
