| 摘要 |
PROBLEM TO BE SOLVED: To shorten substitution time of gas in a space (light path space) where an exposure light passes, such as the space between a projection light system and a substrate, with an inert gas. SOLUTION: The aligner comprises a wafer stage 102, a projection light system 101, a gas feed section 112 for feeding an inert gas in the light path space 116 where exposure light passes between the wafer stage 102 and the projection light system 101, the wafer stage 102 is charged into under the light path space 116 from the downstream, with respect to the flow of peripheral atmosphere.
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