| 摘要 |
PROBLEM TO BE SOLVED: To shut off illumination light during the stoppage of exposure by an exposure unit in forming circuit patterns by using the exposure unit having a multiplicity of modulating elements arranged in a matrix form. SOLUTION: The prescribed patterns are formed on a forming surface by multiple exposure using an exposure unit 2001 having a multiplicity of micromirrors M (m and n) arrayed in a matrix form. A shutter member 23 is disposed between the exposure unit and a light source. When the exposure unit 2001 performs exposure, the shutter member 23 positions a light transmission region 23A on an optical path and introduces the illumination light from the light source to a DMD element 27 of the exposure unit 2001 . The shutter member 23 positions a light shielding region 23B on the optical path and shuts off the illumination light during the stop of the exposure of the exposure unit 2001 .
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