| 摘要 |
PROBLEM TO BE SOLVED: To provide method and system for surely cleaning a substrate by quickly detecting the distribution of particles on the substrate. SOLUTION: After the rear surface of a part of a plurality of substrates contained in a cassette is cleaned and distribution of particles on the rear surface is detected, cleaning conditions of the substrate are altered, based on the distribution of particles thus detected and then the rear surface of the plurality of substrates contained in the cassette is cleaned under altered cleaning conditions. Subsequently, the surface of a part of the plurality of substrates contained in the cassette is cleaned and after detecting distribution of particles on the surface, cleaning conditions of the substrate are altered, based on the distribution of particles thus detected and then the rear surface of the plurality of substrates contained in the cassette is cleaned under altered cleaning conditions.
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