APPARATUS AND METHOD FOR MICROWAVE PLASMA TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for microwave plasma treatment wherein uniform plasma density is attained on the surfaces of substrates and efficient plasma treatment is performed with reliability and stability. SOLUTION: A dielectric window which has an annular sleeve on the periphery thereof and wherein the surface shape and the thickness of the central portion thereof are adjusted in plane is used for a dielectric window placed directly above the surface of a substrate. This in-plane adjustment is made by forming stepped portions by forming projected portions in areas of the dielectric window corresponding to a specified range of the radius in the substrate, or forming recessed portions in areas corresponding to the projected portions on the surface opposite the surface on which the projected portions are formed. The thickness of the portions of the dielectric window subjected to the in-plane adjustment is approx. 1/4 of the wavelength of microwaves in the dielectric, and the portions subjected to the in-plane adjustment are discontinuously formed in the direction of the radius of the dielectric window with a diameter equivalent to an integral multiple of 1/2 the wavelength.