MULTIPLE EXPOSURE LITHOGRAPHY SYSTEM AND MULTIPLE EXPOSURE LITHOGRAPHY METHOD

摘要

PROBLEM TO BE SOLVED: To adequately form prescribed patterns by multiple exposure in accordance with pattern data even if the pixel sizes of the pattern data are any sizes by using exposure units having a multiplicity of modulating elements arrayed in a matrix form. SOLUTION: The exposure units 2001 to 2015 are moved relatively with a forming surface 32 with respect to the one arraying direction of the modulating element arranged in the matrix form of the exposure units 2001 to 2015 along this arraying direction. The modulating elements of the exposure units are selectively made to perform exposure operation in accordance with the prescribed pattern data every time the exposure units move relatively with the top of the forming surface by the distance (A+a) obtained by adding a distance a smaller than the sizes of the unit exposure regions obtained on the forming surface by the modulating elements of the exposure units to the distance A of the integer times the sizes described above.