发明名称 ION SUPPLY DEVICE AND ION SUPPLY METHOD
摘要 PROBLEM TO BE SOLVED: To provide an ion supply device which makes the charged particle continuously hit a target, and makes the target attract and absorb the charged particles as many as possible, and makes the target continuously act (absorb) the charged particle forming substance. SOLUTION: The ion supply device comprises a charged particle (ion) generating means 2 emitting charged particles 1 against a target 3, and an electric potential keeping means 4 keeping the electric potential of the target 3 in order to make the target 3 continuously attract/absorb the charged particles 1.
申请公布号 JP2003059622(A) 申请公布日期 2003.02.28
申请号 JP20010244628 申请日期 2001.08.10
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 SAIDA ITARU
分类号 A45D20/12;A45D2/00;A45D20/00;A45D20/50;A46B15/00;A61N1/00;A61N1/44;H01T23/00;(IPC1-7):H01T23/00 主分类号 A45D20/12
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