POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in sensitivity and resolution and satisfying even a rectangular pattern shape and good edge roughness. SOLUTION: The positive resist composition comprises a compound which generates an acid when irradiated with active light or radiation, a polymer which is insoluble or slightly soluble in an aqueous alkali solution and is made soluble in the aqueous alkali solution by the action of the acid and a compound which includes a specified sulfonimide structure.