发明名称 DEVICE AND METHOD FOR IRRADIATING LASER AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide laser irradiation method/device, with which the energy distribution of laser beams on an irradiating face is made uniform in lasers having high coherence, and to provide a method for manufacturing a semiconductor device, using a semiconductor film obtained by crystallizing the semiconductor film and activating an impurity element. SOLUTION: The laser irradiating device is constituted of multiple lasers, a means for controlling the oscillation of the multiple lasers, a means for composing the multiple laser beams emitted from the multiple lasers into one laser beam, a means for converging the laser beams on the irradiating face or near the face and a means for moving the laser beam to at least one direction. The semiconductor film is irradiated with the laser beam by using the laser irradiating device, the semiconductor film can be crystallized and the impurity element can be activated.</p>
申请公布号 JP2003059859(A) 申请公布日期 2003.02.28
申请号 JP20010244845 申请日期 2001.08.10
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TANAKA KOICHIRO;YAMAZAKI SHUNPEI
分类号 G02F1/1368;B23K26/06;H01L21/20;H01L21/265;H01L21/268;H01L21/336;H01L29/786;H01S5/40;(IPC1-7):H01L21/268;G02F1/136 主分类号 G02F1/1368
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