发明名称 CHEMICAL VAPOR DEPOSITION SYSTEM
摘要 <p>A chemical vapor deposition system (10) includes a housing (12) having an entry (30) and an exit (32) through which glass sheet substrates (G) to be coated are introduced and exited from a deposition chamber (14) defined by lower and upper housing portions (16, 18) having a seal assembly (22) at their horizontal junction which is higher than both the entry and the exit.</p>
申请公布号 WO2003016586(A1) 申请公布日期 2003.02.27
申请号 US2002024924 申请日期 2002.08.07
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