发明名称 Trench DMOS transistor with embedded trench schottky rectifier
摘要 A merged device is that comprises a plurality of MOSFET cells and a plurality of Schottky rectifier cells, as well as a method of designing and making the same. According to an embodiment of the invention, the MOSFET cells comprise: (a) a source region of first conductivity type formed within an upper portion of a semiconductor region, (b) a body region of second conductivity type formed within a middle portion of the semiconductor region, (c) a drain region of first conductivity type formed within a lower portion of the semiconductor region, and (d) a gate region provided adjacent the source region, the body region, and the drain region. The Schottky diode cells in this embodiment are disposed within a trench network and comprise a conductor portion in Schottky rectifying contact with the lower portion of the semiconductor region. At least one MOSFET cell gate region is positioned along a sidewall of the trench network and adjacent at least one Schottky diode cell in this embodiment.
申请公布号 US2003040144(A1) 申请公布日期 2003.02.27
申请号 US20010938253 申请日期 2001.08.23
申请人 BLANCHARD RICHARD A.;HSHIEH FWU-IUAN;SO KOON CHONG 发明人 BLANCHARD RICHARD A.;HSHIEH FWU-IUAN;SO KOON CHONG
分类号 H01L21/336;H01L21/8234;H01L27/04;H01L27/06;H01L29/06;H01L29/41;H01L29/47;H01L29/78;H01L29/872;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L21/823;H01L21/339;H01L31/119;H01L31/113;H01L21/824 主分类号 H01L21/336
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