Method for increasing the efficiency of substrate processing chamber contamination detection

摘要

Embodiments of the invention provide a method and apparatus for detecting and removing contaminant particles from an interior of a substrate processing chamber. The method generally includes imparting a first broadband impulse to the substrate processing chamber, determining if contaminant particles are present in an exhaust line of the substrate processing chamber, and imparting a second broadband impulse to the substrate processing chamber if it is determined that contaminant particles are present in the exhaust line.