A PROCESS FOR THE MANUFACTURING OF A SPUTTER TARGET
摘要
The invention relates to a process for manufacturing a sputter target. The process comprises the steps of - providing a target holder (12); - applying an intermediate layer (14) on said target holder; - applying a top layer (16) on top of said intermediate layer; said top layer comprising a material having a melting point which is substantially higher than the melting point of said target material; - heating the target holder coated with said intermediate layer and said top layer.
申请公布号
WO03016584(A1)
申请公布日期
2003.02.27
申请号
WO2002EP07695
申请日期
2002.07.10
申请人
N.V. BEKAERT S.A.;DE BOSSCHER, WILMERT;DELRUE, HILDE;VANDERSTRAETEN, JOHAN
发明人
DE BOSSCHER, WILMERT;DELRUE, HILDE;VANDERSTRAETEN, JOHAN