发明名称 A PROCESS FOR THE MANUFACTURING OF A SPUTTER TARGET
摘要 The invention relates to a process for manufacturing a sputter target. The process comprises the steps of - providing a target holder (12); - applying an intermediate layer (14) on said target holder; - applying a top layer (16) on top of said intermediate layer; said top layer comprising a material having a melting point which is substantially higher than the melting point of said target material; - heating the target holder coated with said intermediate layer and said top layer.
申请公布号 WO03016584(A1) 申请公布日期 2003.02.27
申请号 WO2002EP07695 申请日期 2002.07.10
申请人 N.V. BEKAERT S.A.;DE BOSSCHER, WILMERT;DELRUE, HILDE;VANDERSTRAETEN, JOHAN 发明人 DE BOSSCHER, WILMERT;DELRUE, HILDE;VANDERSTRAETEN, JOHAN
分类号 C23C2/26;C23C4/08;C23C4/18;C23C14/34;C23C26/00 主分类号 C23C2/26
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