发明名称 |
Semiconductor device and apparatus for manufacturing same |
摘要 |
A semiconductor manufacturing apparatus is provided with a cavity-depth adjusting mechanism for moving a movable member relative to a stationary member to adjust the depth of cavities according to the thickness of a package to be molded. The semiconductor manufacturing apparatus is further provided with a material-thickness adjusting mechanism for moving another movable member relative to another stationary member to adjust the level of a lead frame mounting surface according to the thickness of a lead frame to be mounted.
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申请公布号 |
US2003038363(A1) |
申请公布日期 |
2003.02.27 |
申请号 |
US20020197563 |
申请日期 |
2002.07.18 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MATSUO ITARU |
分类号 |
B29C45/26;B29C45/02;B29C45/14;B29C45/37;B29C45/38;B29C45/40;B29L31/34;H01L21/00;H01L21/56;(IPC1-7):H01L23/34 |
主分类号 |
B29C45/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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