发明名称 Semiconductor device and apparatus for manufacturing same
摘要 A semiconductor manufacturing apparatus is provided with a cavity-depth adjusting mechanism for moving a movable member relative to a stationary member to adjust the depth of cavities according to the thickness of a package to be molded. The semiconductor manufacturing apparatus is further provided with a material-thickness adjusting mechanism for moving another movable member relative to another stationary member to adjust the level of a lead frame mounting surface according to the thickness of a lead frame to be mounted.
申请公布号 US2003038363(A1) 申请公布日期 2003.02.27
申请号 US20020197563 申请日期 2002.07.18
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MATSUO ITARU
分类号 B29C45/26;B29C45/02;B29C45/14;B29C45/37;B29C45/38;B29C45/40;B29L31/34;H01L21/00;H01L21/56;(IPC1-7):H01L23/34 主分类号 B29C45/26
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