发明名称 |
Substrate support with gas feed-through and method |
摘要 |
A substrate support comprises an electrode and a dielectric layer covering the electrode, the dielectric layer having a surface to receive a substrate. A gas feed-through provides a gas to the surface of the dielectric layer and comprises a conduit extending through one or more of the dielectric layer and electrode. A dielectric insert in the gas feed-through has a passage therein that allows the gas to be flowed therethrough. Two opposing electrically conducting cups are around the passage in the dielectric insert.
|
申请公布号 |
US2003037883(A1) |
申请公布日期 |
2003.02.27 |
申请号 |
US20020256441 |
申请日期 |
2002.09.27 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
METT RICHARD R.;NOORBAKHSH HAMID;GREENWAY ROBERT D. |
分类号 |
C23C16/44;C23C16/455;H01J37/32;(IPC1-7):C23F1/00;C23C16/00;H01L21/306 |
主分类号 |
C23C16/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|