发明名称 Substrate support with gas feed-through and method
摘要 A substrate support comprises an electrode and a dielectric layer covering the electrode, the dielectric layer having a surface to receive a substrate. A gas feed-through provides a gas to the surface of the dielectric layer and comprises a conduit extending through one or more of the dielectric layer and electrode. A dielectric insert in the gas feed-through has a passage therein that allows the gas to be flowed therethrough. Two opposing electrically conducting cups are around the passage in the dielectric insert.
申请公布号 US2003037883(A1) 申请公布日期 2003.02.27
申请号 US20020256441 申请日期 2002.09.27
申请人 APPLIED MATERIALS, INC. 发明人 METT RICHARD R.;NOORBAKHSH HAMID;GREENWAY ROBERT D.
分类号 C23C16/44;C23C16/455;H01J37/32;(IPC1-7):C23F1/00;C23C16/00;H01L21/306 主分类号 C23C16/44
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