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发明名称
Gerät zur Erzielung einer gleichmässigen Dosis beim Ionenimplantationsverfahren mit Plasma-Dotierung (PLAD)
摘要
申请公布号
DE69625855(D1)
申请公布日期
2003.02.27
申请号
DE19966025855
申请日期
1996.06.04
申请人
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES INC., GLOUCESTER
发明人
CHAPEK, DAVID LEROY;MALIK, SHAMIM MUHAMMAD;FELCH, SUSAN B.;SHENG, TIENYU TERRY;KISSICK, MICHAEL WILLIAM
分类号
H01J37/317;C23C14/48;H01J37/32;H01L21/22;H01L21/265;(IPC1-7):H01J37/32;H01J37/08;H01J37/04;C23C16/50
主分类号
H01J37/317
代理机构
代理人
主权项
地址
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