发明名称 |
Chemical amplifying type positive resist composition |
摘要 |
A resist composition excellent in balance of performance of resolution and sensitivity as well as in solubility and, particularly, suitable for use as a positive photo resist which comprises a resin having a alicyclic lactone structure unit that is insoluble in alkali by itself but becomes soluble due to the action of an acid, a solvent containing 2-heptanone and an acid generating agent, wherein a content of 2-heptanone in the solvent is in a weight ratio of from about 5 to about 95% is provided.
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申请公布号 |
US2003039918(A1) |
申请公布日期 |
2003.02.27 |
申请号 |
US20020105386 |
申请日期 |
2002.03.26 |
申请人 |
TAKATA YOSHIYUKI;MORIUMA HIROSHI |
发明人 |
TAKATA YOSHIYUKI;MORIUMA HIROSHI |
分类号 |
G03F7/039;C08F20/28;G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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