发明名称 MANUFACTURING METHOD FOR MICROMIRROR ELEMENT AND THE MICROMIRROR ELEMENT MANUFACTURED BY THE SAME
摘要 PURPOSE: To provide a manufacturing method for a micromirror element which has a thin torsion bar having high-precision thickness while accurately positioned in the thickness-directional middle of a material substrate, and to provide the micromirror element which is manufactured by the method. CONSTITUTION: To manufacture the micromirror element which has a mirror formation part, a frame part, and the torsion bar by using the material substrate having a laminate structure including silicon layers 209 and 21 and at least one intermediate layer 160, a stage for forming a pre-torsion-bar T' which is thinner than the mirror formation part and in contact with the intermediate layer by etching the silicon layer 20 and a stage for forming the torsion bar T by removing the intermediate layer 160 which is in contact with the pre- torsion-bar T' are carried out.
申请公布号 KR20030016149(A) 申请公布日期 2003.02.26
申请号 KR20010080365 申请日期 2001.12.18
申请人 FUJITSU LIMITED;FUJITSU MEDIA DEVICES LIMITED 发明人 KOUMA NORINAO;MIZUNO YOSHIHIRO;OKUDA HISAO;SAWAKI IPPEI;TSUBOI OSAMU;UEDA SATOSHI;YAMAGISHI FUMIO
分类号 B01D53/88;B01J8/04;B81B3/00;B81C1/00;C01B3/16;G02B26/08;(IPC1-7):G02B26/08 主分类号 B01D53/88
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