| 摘要 |
PROBLEM TO BE SOLVED: To provide a raw material compound which contains an organic ruthenium compound as a main component, is used for CVD, has a low melting point and excellent solubility in organic solvents, and can form thin films having good homology, and to provide a method for producing the same. SOLUTION: This raw material compound which contains the organic ruthenium compound as a main component and is used for CVD is characterized in that the organic ruthenium compound comprises only either one of the cis and trans isomers of tris(2,4-octadionato)ruthenium(III) represented by the formula. The method for producing the raw material compound which comprises only the cis isomer or trans isomer and is used for CVD is characterized by comprising a process for allowing an alumina-containing adsorbent to adsorb the tris(2,4- octadionato)ruthenium(III) produced by an arbitrary method, a process for bringing the adsorbent into contact with the first solvent to elute the trans isomer, and further a process for bringing the adsorbent into contact with the second solvent having larger polarity than that of the first solvent to elute the cis isomer.
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