METHOD FOR DEPOSITING SUPERCONDUCTING THIN FILM USING MOCVD PROCESS

摘要

PROBLEM TO BE SOLVED: To deposit an RE-Ba-Cu-O based superconducting thin film which has a large area and uniform compositional ratio by an MOCVD(metal organic chemical vapor deposition) process. SOLUTION: The superconducting thin film is deposited on a substrate by the MOCVD process. In this case, as a raw material MO gas of Cu, an amine adduct of Cu(DPM)2 is used, so that the consumption of the MO gas caused by thermal decomposition before its arrival at the substrate can be prevented.