| 摘要 |
PROBLEM TO BE SOLVED: To obtain a silane composition capable of forming a silicon film or a silicon oxide film on a substrate by using a liquid raw material with a simple operation and device different from a method requiring a complex vacuum system device such as a CVD method of sputtering method, efficiently e.g. in a high yield and forming speed, and to provide a method for forming the silicon film or the silicon oxide film by using the composition. SOLUTION: The silane composition contains a polysilane compound and at least 1 kind of a silane compound selected from the group consisting of cyclopentasilane, cyclohexasilane and silylcyclopentasilane. The method for forming the silicone film or the silicon oxide film comprises applying the silane composition on the base substrate and treating the formed coated film under a non-oxidizing atmosphere or an oxidizing atmosphere, respectively.
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